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13 results

Conference Proceedings

1. Simulation of resist heating in electron-beam lithography

Babin,S.V. ; Kuzmin,I.Yu.

Pub. info.:	Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California. pp.374-381, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3048

Conference Proceedings

2. CD variation in 30-kV EBL due to resist heating:experiment and simulation

Babin,S.V. ; Hudek,P. ; Kostic,I. ; Kuzmin,I.Yu.

Pub. info.:	Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California. pp.368-373, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3048

Conference Proceedings

3. Comparative study of resist heating and proximity effect influence on CD variation in 30-kV EBL

Babin,S.V. ; Hudek,P. ; Kostic,I. ; Kuzmin,I.Yu.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.655-661, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

Conference Proceedings

4. System architecture choices for an advanced mask writer(100 to 130 nm)

Chakarian,V. ; III,F.Raymond ; Saver,C.A. ; Babin,S.V. ; Innes,R. ; Sagle,A.L. ; Hofmann,U. ; Shamoun,B. ; Trost,D. ; Ghanbari,A. ; Abboud,F.E.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.228-242, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

5. Initial benchmarking of a new electron-beam raster pattern generator for 130-to 100-nm maskmaking

Sauer,C.A. ; Abboud,F.E. ; Babin,S.V. ; Chakarian,V. ; Ghanbari,A. ; Innes,R. ; Trost,D. ; III,F.Raymond

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.284-300, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

6. Evaluation of the dry resist octavinylsilsesquioxan and its application to three-dimensional electron-beam lithography

Koops,H.W.P. ; Babin,S.V. ; Weber,M. ; Dahm,G. ; Holopkin,A. ; Lyakhov,M.N.

Pub. info.:	Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California. pp.578-587, 1996. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2724

Conference Proceedings

7. Dry resist technology to fabricate optimized microlenses centered to the end of a monomode fiber with electron-beam lithography

Babin,S.V. ; Weber,M. ; Koops,H.W.P.

Pub. info.:	Current developments in optical design and optical engineering VI : 5-7 August 1996, Denver, Colorado. pp.95-101, 1996. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2863

Conference Proceedings

8. Throughput optimization of electron-beam lithography in photomask fabrication regarding acceptable accuracy of critical dimensions

Babin,S.V. ; Kuzmin,I.Y.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.545-551, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

Conference Proceedings

9. Comparison of writing strategies subject to resist heating

Babin,S.V.

Pub. info.:	18th Annual BACUS Symposium on Photomask Technology and Management. pp.389-397, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3546

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Conference Proceedings

10. Software tool for temperature simulation in electron-beam lithography: TEMPTATION

Babin,S.V. ; Kuzmin,I.Yu. ; Sergeev,G.

Pub. info.:	17th Annual BACUS Symposium on Photomask Technology and Management. pp.464-470, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3236

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Author: Babin,S.V.