1.

Conference Proceedings
Conference Proceedings
1. Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing
Mahorowala,A.P. ; Babich,K. ; Petrillo,K.E. ; Simons,J.P. ; Angelopoulos,M. ; Patel,V. ; Grill,A. ; Halle,S. ; Conti,R. ; Wu,C.-H.J. ; Wise,R. ; Chen,L. ; Thomas,A.C. ; Lee,B. ; Mahorowala,A.P.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.306-316,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
2.

Conference Proceedings
Conference Proceedings
2. Extension of 248-nm optical lithography: a thin film imaging approach
Lin,Q. ; Katnani,A.D. ; Brunner,T.A. ; DeWan,C. ; Fairchok,C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Seeger,D.E. ; Angelopoulos,M. ; Soonyakumaran,R. ; Wallraff,G.M. ; Hofer,D.C.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.278-288,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
3.

Conference Proceedings
Conference Proceedings
3. Positive bilayer resists for 248-and 193-nm lithography
Sooriyakumaran,R. ; Wallraff,G.M. ; Larson,C.E. ; Fenzel-Alexander,D. ; DiPietro,R.A. ; Opitz,J. ; Hofer,D.C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Angelopoulos,M. ; Lin,Q. ; Katnani,A.D.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.219-227,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
4.

Conference Proceedings
Conference Proceedings
4. Effects of underlayer on performance of bilayer resists for 248-nm lithography
Babich,K. ; Callegari,A. ; Petrillo,K.E. ; Simons,J.P. ; LaTulipe,D.C.,Jr. ; Angelopoulos,M. ; Lin,Q.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.726-734,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
5.

Conference Proceedings
Conference Proceedings
5. DUV stability of carbon films for attenuated phase-shift mask applications
Callegari,A. ; Babich,K. ; Doany,F. ; Cardone,F. ; Purushothaman,S.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.406-411,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
6.

Conference Proceedings
Conference Proceedings
6. Evaluation of molybdenum silicide for use as a 193-nm phase-shifting absorber in photomask manufacturing
Hibbs,M.S. ; Ushida,M. ; Babich,K. ; Mitsui,H. ; Bourov,A.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.444-451,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
7.

Conference Proceedings
Conference Proceedings
7. Novel Si-based composite thin films for 193/157-nm attenuated phase-shift mask (APSM) applications
Chey,S.J. ; Guarnieri,C.R. ; Babich,K. ; Pope,K.R. ; Goldfarb,D. ; Angelopoulos,M. ; Racette,K.C. ; Hibbs,M.S. ; Gibson,M.L. ; Kimmel,K.R.
Pub. info.: Optical Microlithography XIV.  4346  pp.798-805,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
8.

Conference Proceedings
Conference Proceedings
8. When is bilayer thin-film imaging suitable: comparison with single-layer resists
Halle,S. ; Thomas,A.C. ; Armacost,M. ; Dalton,T.J. ; Chen,X.L. ; Bukofsky,S.J. ; Genz,O. ; Lu,Z.G. ; Butt,S.A. ; Chen,Z. ; Ferguson,R.A. ; Coker,E. ; Leidy,R.K. ; Lin,Q. ; Mahorowala,A.P. ; Babich,K. ; Petrillo,K.E. ; Angelopoulos,M. ; Ignatowicz,M. ; Bui,B.
Pub. info.: Optical Microlithography XIV.  4346  pp.970-981,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
9.

Conference Proceedings
Conference Proceedings
9. Optical characterization of attenuated phase shifters
Callegari,A. ; Babich,K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.507-514,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050