1.

Conference Proceedings
Conference Proceedings
1. An analysis of double exposure lithography options
S. Lee ; J. Byers ; K. Jen ; P. Zimmerman ; B. Rice
Pub. info.: Optical Microlithography XXI.  2  pp.69242A-1-69242A-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
2.

Conference Proceedings
Conference Proceedings
2. Development and evaluation of 193nm immersion generation-three fluid candidates
P. A. Zimmerman ; J. Byers ; B. Rice ; C. K. Ober ; E. P. Giannelis
Pub. info.: Advances in resist materials and processing technology XXV.  1  pp.69230A-1-69230A-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923
3.

Conference Proceedings
Conference Proceedings
3. Development of an operational high refractive index resist for 193nm immersion lithography
P. A. Zimmerman ; J. Byers ; E. Piscani ; B. Rice ; C. K. Ober
Pub. info.: Advances in resist materials and processing technology XXV.  1  pp.692306-1-692306-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923