1.

Conference Proceedings
Conference Proceedings
1. Extending scatterometry to the measurements of sub 40 nm features, double patterning structures, and 3D OPC patterns
O. Kritsun ; B. La Fontaine ; Y. Liu ; C. S. Saravanan
Pub. info.: Optical Microlithography XXI.  1  pp.69241M-1-69241M-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
2.

Conference Proceedings
Conference Proceedings
2. Proposal for determining exposure latitude requirements
H. J. Levinson ; Y. Ma ; M. Koenig ; B. La Fontaine ; R. Seltmann
Pub. info.: Optical Microlithography XXI.  1  pp.69241J-1-69241J-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924