1.

Conference Proceedings
Conference Proceedings
1. Electron beam lithography simulation based on a single convolution approach: application for sub-45nm nodes
J. C. L. denmat ; S. Manakli ; B. Icard ; C. Soonekindt ; B. Minghetti ; O. L. borgne ; L. Pain
Pub. info.: EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6533
2.

Conference Proceedings
Conference Proceedings
2. Magic: a European program to push the insertion of maskless lithography
L. Pain ; B. Icard ; S. Tedesco ; B. Kampherbeek ; G. Gross
Pub. info.: Emerging lithographic technologies XII.  1  pp.69211S-1-69211S-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921
3.

Conference Proceedings
Conference Proceedings
3. New alignment marks for improved measurement maturity
U. Weidenmueller ; H. Alves ; B. Schnabel ; B. Icard ; L. Pain
Pub. info.: EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany.  pp.679211-1-679211-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6792