H. Zang ; W. Loh ; H. Oh ; K. Choi ; H. Nguyen ; P. Lo ; B. Cho
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment. pp.105-112, 2007. Pennington, NJ. Electrochemical Society
H. Oh ; K. Choi ; W. Loh ; T. Htoo ; S. Chua ; B. Cho
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment. pp.95-98, 2007. Pennington, NJ. Electrochemical Society
Proceedings of DASIA 2007 : Data Systems In Aerospace, 29 May-1 June 2007, Naples, Italy. 2007. Noordwijk, The Netherlands. ESA Communication Production Office
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment. pp.437-444, 2007. Pennington, NJ. Electrochemical Society
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment. pp.331-338, 2007. Pennington, NJ. Electrochemical Society