1.

Conference Proceedings
Conference Proceedings
1. SEM metrology for advanced lithographies
B. Bunday ; J. Allgair ; B. J. Rice ; J. Byers ; Y. Avitan ; R. Peltinov ; M. Bar-zvi ; O. Adan ; J. Swyers ; R. Z. Shneck
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
2.

Conference Proceedings
Conference Proceedings
2. The coming of age of tilt CD-SEM
B. Bunday ; J. Allgair ; E. Solecky ; C. Archie ; N. G. Orji ; J. Beach ; O. Adan ; R. Peltinov ; M. Bar-zvi ; J. Swyers
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
3.

Conference Proceedings
Conference Proceedings
3. Realizing value-added metrology
B. Bunday ; P. Lipscomb ; J. Allgair ; D. Patel ; M. Caldwell ; E. Solecky ; C. Archie ; J. Morningstar ; B. J. Rice ; B. Singh ; J. Cain ; I. Emami ; B. Banke, Jr. ; A. Herrera ; V. Ukraintsev ; J. Schlessinger ; J. Ritchison
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
4.

Conference Proceedings
Conference Proceedings
4. Fundamental limits of optical critical dimension metrology: a simulation study
R. Silver ; T. Germer ; R. Attota ; B. M. Barnes ; B. Bunday ; J. Allgair ; E. Marx ; J. Jun
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
5.

Conference Proceedings
Conference Proceedings
5. Line edge roughness characterization of sub-50nm structures using CD-SAXS: round-robin benchmark results
C. Wang ; R. L. Jones ; E. K. Lin ; W. Wu ; J. S. Villarrubia ; K. Choi ; J. S. Clarke ; B. J. Rice ; M. Leeson ; J. Roberts ; R. Bristol ; B. Bunday
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
6.

Conference Proceedings
Conference Proceedings
6. Impact of sampling on uncertainty: semiconductor dimensional metrology applications
B. Bunday ; B. Rijpers ; B. Banke ; C. Archie ; I. B. Peterson
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.69220X-1-69220X-22,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922
7.

Conference Proceedings
Conference Proceedings
7. Characterization of sub-50-nm line array structures with angle-resolved multiple wavelength scatterometry
M. Kotelyanskii ; F. Shen ; G. Jiang ; B. Bunday
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  2  pp.69223N-1-69223N-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922
8.

Conference Proceedings
Conference Proceedings
8. Measurement of high-k and metal film thickness on FinFET sidewalls using scatterometry
T. G. Dziura ; B. Bunday ; C. Smith ; M. M. Hussain ; R. Harris
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.69220V-1-69220V-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922
9.

Conference Proceedings
Conference Proceedings
9. Major trends in extending CD-SEM utility
B. Bunday ; J. Allgair ; K. Yang ; S. Koshihara ; H. Morokuma ; A. Danilevsky ; C. Parker ; L. Page
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518