1.

Conference Proceedings
Conference Proceedings
1. Meeting overlay requirements for future technology nodes with in-die overlay metrology
B. Schulz ; R. Seltmann ; J. Busch ; F. Hempel ; E. Cotte ; B. Alles
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
2.

Conference Proceedings
Conference Proceedings
2. An empirical approach adressing the transfer of mask placement errors during exposure
B. Alles ; B. Simeon ; E. Cotte ; T. Wandel ; B. Schulz ; R. Seltmann
Pub. info.: EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6533
3.

Conference Proceedings
Conference Proceedings
3. Modeling the work piece charging during e-beam lithography
B. Alles ; E. Cotte ; B. Simeon ; T. Wandel
Pub. info.: Optical Microlithography XXI.  3  pp.69244P-1-69244P-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924