1.

Conference Proceedings
Conference Proceedings
1. How refractive micro-optics enable lossless hyper-NA illumination systems for immersion lithography [6281-49]
Ganser, H. ; Darscht, M. ; Miklyaev, Y. ; Hauschild, D. ; Aschke, L.
Pub. info.: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810P-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6281
2.

Conference Proceedings
Conference Proceedings
2. Production challenges of making an EUV mask blank(Invited Paper)
Aschke, L. ; Becker, H. W. ; Friemel, F. ; Leutbecher, T. ; Olschewski, N. ; Renno, M. ; Ruggeberg, F. ; Schiffler, M. ; Schmidt, F. ; Sobel, F. ; Walter, K. ; Heβ, G. ; Lenzen, F. ; Knapp, K. ; Alkemper, J. ; Hack, H. ; Megges, K. ; Mitra, I. ; Muller, R. ; Nolte, U. ; Schumacher, J. ; Pannhorst, W.
Pub. info.: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.94-104,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5504
3.

Conference Proceedings
Conference Proceedings
3. Effect of electrostatic chucking on EUVL mask flatness
Mikkelson, A. R. ; Engelstad, R. L. ; Lovell, E. G. ; Aschke, L. ; Ruggeberg, F. ; Sobel, F.
Pub. info.: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.120-128,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5504
4.

Conference Proceedings
Conference Proceedings
4. High-throughput homogenizers for hyper-NA illumination systems [6154-98]
Ganser, H. ; Darscht, M. ; Miklyaev, Y. ; Hauschild, D. ; Aschke, L.
Pub. info.: Optical Microlithography XIX.  pp.61542N-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
5.

Conference Proceedings
Conference Proceedings
5. Improved materials meeting the demands for EUV substrates
Mitra, I. ; Alkemper, J. ; Nolte, U. ; Engel, A. ; Mueller, R. ; Ritter, S. ; Hack, H. ; Megges, K. ; Kohlmann, H. ; Pannhorst, W. ; Davis, M.J. ; Aschke, L. ; Knapp, K.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.219-226,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
6.

Conference Proceedings
Conference Proceedings
6. Cleaning of low thermanl expansion materials for low-defect EUVL mask substrates
Krueger-Velthusen, E. ; Friemel, F. ; Aschke, L. ; Lenzen, F.
Pub. info.: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.38-40,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4764
7.

Conference Proceedings
Conference Proceedings
7. High-performance 6-in. EUV mask blanks produced under real production conditions by ion-beam sputter deposition
Becker, H.W. ; Sobel, F. ; Aschke, L. ; Renno, M. ; Krieger, J. ; Buttgereit, U. ; HeB, G. ; Lenzen, F. ; Knapp, K. ; Yulin, S.A. ; Feigl, T. ; Kuhlmann, T. ; Kaiser, N.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.389-399,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
8.

Conference Proceedings
Conference Proceedings
8. Ion beam sputter deposition of low-defect EUV mask blanks on 6-in. LTEM substrates in a real production environment
Becker, H.W. ; Aschke, L. ; Schubert, B. ; Krieger, J. ; Lenzen, F. ; Yulin, S.A. ; Feigl, T. ; Kuhlmann, T. ; Kaiser, N.
Pub. info.: Emerging Lithographic Technologies VI.  Part Two  pp.503-508,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
9.

Conference Proceedings
Conference Proceedings
9. Absorber stack optimization toward EUV lithography mask blank pilot production
Sobel, F. ; Aschke, L. ; Renno, M. ; Seitz, H. ; Becker, H. W. ; Olschewski, N. ; Reichardt, T. ; Hess, G. ; Buttgereit, U. ; Knapp, K. ; Letzkus, F. ; Butschke, J. ; Koepernik, C.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.781-790,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
10.

Conference Proceedings
Conference Proceedings
10. Thermal expansion behavior of proposed EUVL substrate materials
Mitra, I. ; Davis, M.J. ; Alkemper, J. ; Mueller, R. ; Kohlmann, H. ; Aschke, L. ; Moersen, E. ; Ritter, S. ; Hack, H. ; Pannhorst, W.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.462-468,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688