1.

Conference Proceedings
Conference Proceedings
1. Investigating a lithography strategy for diagonal routing architecture at sub-100nm technology nodes
Li, S. ; Chen, T. ; Shah, S. ; Joshi, K. ; Thumaty, K. ; Arora, N.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.368-377,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
2.

Conference Proceedings
Conference Proceedings
2. Manufacturability of the X Architecture at the 90-nm technology node
Smayling, M.C. ; Sarma, R.C. ; Nagata, T. ; Arora, N. ; Duane, M.P. ; Oemardani, S. ; Shah, S.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.39-46,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
3.

Conference Proceedings
Conference Proceedings
3. Taking the X Architecture to the 65-nm technology node
Sarma, R.C. ; Smayling, M.C. ; Arora, N. ; Nagata, T. ; Duane, M.P. ; Shah, S. ; Keston, H.J. ; Oemardani, S.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.47-54,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379