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Data analysis and modeling for process control III : 23 February, 2006, San Jose, California, USA. pp.61550L-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.643-650, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
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Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA. pp.592-602, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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