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11 results

Conference Proceedings

1. Toward a unified advanced CD-SEM specification for sub-0.18-ｦﾌm technology

Allgair,J. ; Archie,C.N. ; Banke,W. ; Bogardus,H. ; Griffith,J.E. ; Marchman,H.M. ; Postek,M.T. ; Saraf,L.H. ; Schlesinger,J.E. ; Singh,B. ; Sullivan,N.T. ; Trimble,L.E. ; Vladar,A.E. ; Yanof,A.W.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.138-150, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

2. Characterization of CD control for sub-0.18-ｦﾌm lithographic patterning

Sturtevant,J.L. ; Allgair,J. ; Fu,C.-C. ; Green,K.G. ; Hershey,R.R. ; Kling,M.E. ; Litt,L.C. ; Lucas,K.D. ; Roman,B.J. ; Seligman,C.S. ; Schippers,M.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.220-227, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

3. Comparison of ANOVA and Latin square measurement system analysis techniques

Allgair,J.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.806-809, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

4. SPC tracking and run monitoring of a CD SEM

Allgair,J. ; Ruehle,D.G. ; Elliott,R.C. ; Herrera,P.P. ; Miller,J.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.243-251, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

5. Manufacturing considerations for implementation of scatterometry for process monitoring

Allgair,J. ; Benoit,D.C. ; Hershey,R.R. ; Litt,L.C. ; Abdulhalim,I.S. ; Braymer,B. ; Faeyrman,M. ; Robinson,J.C. ; Whitney,U.K. ; Xu,Y. ; Zalicki,P. ; Seligson,J.L.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.125-134, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

6. Benchmarking of advanced CD-SEMs against a new unified specification for sub-0.18-μm lithography

Deleporte,A.G. ; Allgair,J. ; Archie,C.N. ; Banke,G.W. ; Postek,M.T. ; Schlesinger,J.E. ; Vladar,A.E. ; Yanof,A.W.

Pub. info.:	Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA. pp.42-57, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4181

Conference Proceedings

7. Benchmarking of advanced CD-SEMs against the new unified specification for sub-0.18-ｦﾌm lithography

Deleporte,A.G. ; Allgair,J. ; Archie,C.N. ; Banke,G.W. ; Postek,M.T. ; Schlesinger,J.E. ; Vladar,A.E. ; Yanof,A.W.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.12-27, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

8. Feature integrity monitoring for process control using a CD SEM

Allgair,J. ; Chen,G. ; Marples,S.J. ; Goodstein,D.M. ; Miller,J.D. ; Santos,F.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.227-231, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

9. Vapor Etching of Beam-Deposited Carbon on Silicon Dioxide Films

Ryan,J.M. ; Allgair,J. ; Whidden,T. ; Kozicki,M.N. ; Ferry,D.K.

Pub. info.:	Quantum transport in ultrasmall devices. pp.437-440, 1995. New York. Kluwer Academic Publishers
Title of ser.:	NATO ASI series. Series B, Physics
Ser. no.:	342

10.

Conference Proceedings

10. Alternative method for monitoring an in-line CD SEM

Herrera,P.P. ; Dick,S.A. ; Allgair,J.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XI. pp.557-564, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3050

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Author: Allgair,J.