1.

Conference Proceedings
Conference Proceedings
1. Fully CMOS-compatible low-power microheater
Laconte, J. ; Dupont, C. ; Akheyar, A. ; Raskin, J.-P. ; Flandre, D.
Pub. info.: Design, test, integration, and packaging of MEMS/MOEMS 2002 : 6-8 May, 2002, Cannes, France.  pp.634-644,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4755
2.

Conference Proceedings
Conference Proceedings
2. 22 Silicide scaling: Co, Ni or CoNi?
Lauwers, A. ; Kitti, IA. ; Akheyar, A. ; Van Dal, M ; Chamirian, O. ; de Potter, M ; Lindsay, R. ; Muex, K.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.167-182,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
3.

Conference Proceedings
Conference Proceedings
3. 26 Co-silicide, Co(Ni)-silicide and Ni-silicide to source¥drain contact resistance
Akheyar, A. ; Lauwers, A. ; Kitti, J.A. ; De Potter, M ; Chamirian, O. ; Jonckheere, R. ; Leunissen, P. ; van Dal, M ; Lindsay, R. ; Tempel, G. ; Maex, K.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.197-204,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
4.

Conference Proceedings
Conference Proceedings
4. 23 Ni-based silicides: material issues for advanced CMOS applications
Kittl, J.A. ; Lauwers, A. ; Chamirian, O. ; Van Dal, M ; Akheyar, A. ; Richard, O. ; Lisoni, J.G. ; De Potter, M ; Lindsay, R. ; Moex, K.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.177-182,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
5.

Conference Proceedings
Conference Proceedings
5. High-K Materials for Tunnel Barrier Engineering in Future Memory Technologies
Blomme, P. ; Govoreanu, B. ; Rosmeulen, M. ; Akheyar, A. ; Haspeslagh, L. ; De Vos, J. ; Lorenzini, M. ; Van Houdt, J. ; De Meyer, K.
Pub. info.: Dielectrics for nanosystems: materials science, processing, reliability, and manufacturing : proceedings of the First international symposium.  pp.169-182,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-04