1.

Conference Proceedings
Conference Proceedings
1. Simulation of resist heating effect with e-beam lithography using distributed processing (DP) [5853-18]
Ki, W.-T. ; Ahn, B.-S. ; Park, J.-S. ; Choi, S.-W. ; Ma, S.-B. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.416-424,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
2.

Conference Proceedings
Conference Proceedings
2. Comparison of vector theories for aerial image calculation
Ahn, B.-S. ; Zinn, S.Y. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1529-1535,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Analysis of dose modulation method for fogging effect correction at 50-KeV e-beam system
Jang, S.-H. ; Yang, S.-H. ; Ahn, B.-S. ; Ki, W.-T. ; Choi, J.-H. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.669-674,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446