1.

Conference Proceedings
Conference Proceedings
1. Process for improved reflectivity uniformity in extreme-ultraviolet lithography (EUVL) masks
Thiel, C. ; Racette, K.C. ; Fisch, E. ; Lawliss, M. ; Kindt, L. ; Huang, C. ; Ackel, R. ; Levy, M.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.339-346,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
2.

Conference Proceedings
Conference Proceedings
2. Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC
Racette, K.C. ; Williams, C.T. ; Fisch, E. ; Kindt, L. ; Lawliss, M. ; Ackel, R. ; Lercel, M.J.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.161-172,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
3.

Conference Proceedings
Conference Proceedings
3. EPL mask fabrication
Lercel, M.J. ; Williams, C.T. ; Lawliss, M. ; Ackel, R. ; Kindt, L. ; Fisch, E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.790-798,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754