1.

Conference Proceedings
Conference Proceedings
1. Pattern generation requirements for mask making beyond 130 nm
Abboud,F.E. ; Gesley,M.A. ; Maldonado,J.R.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.236-244,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
2.

Conference Proceedings
Conference Proceedings
2. System architecture choices for an advanced mask writer(100 to 130 nm)
Chakarian,V. ; III,F.Raymond ; Saver,C.A. ; Babin,S.V. ; Innes,R. ; Sagle,A.L. ; Hofmann,U. ; Shamoun,B. ; Trost,D. ; Ghanbari,A. ; Abboud,F.E.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.228-242,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Lithographic analysis of multipass gray writing strategy for electron-beam pattern generation
Chabala,J.M. ; Abboud,F.E. ; Dean,R.L. ; Weaver,S. ; Cole,D.M. ; Sauer,C.A. ; F.Raymond ? ; Hofmann,U.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part1  pp.80-99,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
4.

Conference Proceedings
Conference Proceedings
4. Multipass gray printing for a new MEBES 4500S mask lithography system
Abboud,F.E. ; Dean,R.L. ; Doering,J.J. ; Eckes,W. ; Gesley,M.A. ; Hofmann,U. ; Mulera,T. ; Naber,R.J. ; Pastor,M. ; Phillips,W. ; Raphael,J. ; Raymond,F.,?. ; Sauer,C.A.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.116-124,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
5.

Conference Proceedings
Conference Proceedings
5. Extension of graybeam writing for the 130-nm technology node
Chabala,J.M. ; Abboud,F.E. ; Sauer,C.A. ; Weaver,S. ; Lu,M. ; Pearce-Percy,H.T. ; Hofmann,U. ; Vernon,M. ; Ton,D. ; Cole,D.M. ; Naber,R.J.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.36-48,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
6.

Conference Proceedings
Conference Proceedings
6. Lithography and CD performance of advanced MEBES mask pattern generators
Chabala,J.M. ; Cole,D.M. ; Pearce-Percy,H.T. ; Phillips,W. ; Lu,M. ; Weaver,S. ; Alexander,D. ; Coleman,T. ; Sauer,C.A. ; Abboud,F.E.
Pub. info.: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany.  pp.200-215,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3996
7.

Conference Proceedings
Conference Proceedings
7. Evaluation of a high-dose extended multipass gray writing system for 130-nm pattern generation
Chabala,J.M. ; Weaver,S. ; Alexander,D. ; Pearce-Percy,H.T. ; Lu,M. ; Cole,D.M. ; Abboud,F.E.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.309-325,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
8.

Conference Proceedings
Conference Proceedings
8. Initial benchmarking of a new electron-beam raster pattern generator for 130-to 100-nm maskmaking
Sauer,C.A. ; Abboud,F.E. ; Babin,S.V. ; Chakarian,V. ; Ghanbari,A. ; Innes,R. ; Trost,D. ; III,F.Raymond
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.284-300,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
9.

Conference Proceedings
Conference Proceedings
9. Elements of an advanced pattern generator for 130- to 100-nm maskmaking
Chakarina,V. ; Sauer,C.A. ; Shamoun,B. ; Chiles,F. ; Trost,D. ; Zywno,M. ; Hofmann,U. ; Teizel,R. ; Prior,R. ; III,F.Raymond ; Ghanbari,A. ; Abboud,F.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.580-593,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
10.

Conference Proceedings
Conference Proceedings
10. Lithographic performance results for a new 50-kV electron-beam mask writer
Chakarian,V. ; Bylciw,S.R. ; Sauer,C.A. ; Trost,D. ; Zywno,M. ; Teitzel,R. ; Raymond Ⅲ,F. ; Abboud,F.E.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.1-15,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186