1.

Conference Proceedings
Conference Proceedings
1. Feature biasing versus feature-assisted lithography: a comparison of proximity correction methods for 0.5∗(λ/NA) lithography
R. Pforr ; A.K. Wang ; K. Ronse ; L. Van den Hove ; A. Yen
Pub. info.: Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California.  pp.150-170,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2440
2.

Conference Proceedings
Conference Proceedings
2. OCD metrology by floating n/k
S. Yu ; J. Huang ; C. Ke ; T. Gau ; B. J. Lin ; A. Yen ; L. Lane ; V. Vuong ; Y. Chen
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518