1.

Conference Proceedings
Conference Proceedings
1. Hyper-NA imaging of 45nm node random CH layouts using inverse lithography
E. Hendrickx ; A. Tritchkov ; K. Sakajiri ; Y. Granik ; M. Kempsell
Pub. info.: Optical Microlithography XXI.  1  pp.69240L-1-69240L-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
2.

Conference Proceedings
Conference Proceedings
2. Model-based SRAF insertion through pixel-based mask optimization at 32nm and beyond
K. Sakajiri ; A. Tritchkov ; Y. Granik
Pub. info.: Photomask and next-generation lithography mask technology XV.  1  pp.702811-1-702811-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028
3.

Conference Proceedings
Conference Proceedings
3. Double-patterning decomposition, design compliance, and verification algorithms at 32nm hp
A. Tritchkov ; P. Glotov ; S. Komirenko ; E. Sahouria ; A. Torres
Pub. info.: Photomask technology 2008.  1  pp.71220S-1-71220S-15,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7122
4.

Conference Proceedings
Conference Proceedings
4. AIMS-45 image validation of contact hole patterns affer inverse lithography at NA 1.35
E. Hendrickx ; R. Birkner ; M. Kempsell ; A. Tritchkov ; G. Vandenberghe
Pub. info.: Photomask technology 2008.  1  pp.71221E-1-71221E-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7122
5.

Conference Proceedings
Conference Proceedings
5. Simultaneous model-based main feature and SRAF optimization for 2D SRAF implementation to 32 nm critical layers
A. Yehia ; A. Tritchkov
Pub. info.: Photomask technology 2007.  2  pp.67302K-1-67302K-10,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
6.

Conference Proceedings
Conference Proceedings
6. Double pattern EDA solutions for 32nm HP and beyond
G. E. Bailey ; A. Tritchkov ; J. Park ; L. Hong ; V. Wiaux ; E. Hendrickx ; S. Verhaegen ; P. Xie ; J. Versluijs
Pub. info.: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6521