1.

Conference Proceedings
Conference Proceedings
1. Comparison of different optical proximity correction models with three-dimensional photolithography simulation over planar substrates (Invited Paper)
Rey,J.C. ; Li,J. ; Boksha,V.V. ; Bernard,D.A.
Pub. info.: Microlithographic Techniques in IC Fabrication.  pp.68-81,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3183
2.

Conference Proceedings
Conference Proceedings
2. Sub-half-micron contact window design with 3D photolithography simulator
Brainerd,S.K. ; Bernard,D.A. ; Rey,J.C. ; Li,J. ; Granik,Y. ; Boksha,V.V.
Pub. info.: Optical Microlithography X.  pp.552-566,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
3.

Conference Proceedings
Conference Proceedings
3. Model-based optical proximity correction including effects of photoresist processes
Li,J. ; Bernard,D.A. ; Rey,J.C. ; Boksha,V.V.
Pub. info.: Optical Microlithography X.  pp.643-651,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051