1.

Conference Proceedings
Conference Proceedings
1. DFM: a practical layout optimization procedure for the improved process window for an existing 90-nm product [6156-11]
Ho, J. ; Wang, Y. ; Hou, Y.-C. ; Lin, B. S.-M. ; Yu, C. C. ; Wu, K. ; Ma, C.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61560C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
2.

Conference Proceedings
Conference Proceedings
2. Laser Processing Of Amorphous Silicon For Polysilicon Devices, Circuits And Flat-Panel Imagers
Boyce, J. B. ; Fulks, R. T. ; Ho, J. ; Lu, J. P. ; Mei, P. ; Street, R. A. ; VanSchuylenbergh, K. F. ; Wang, Y.
Pub. info.: Amorphous and heterogeneous silicon thin films - 2000 : symposium held April 24-28, 2000, San Francisco, California, U.S.A..  pp.A31.4-,  2001.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 609
3.

Conference Proceedings
Conference Proceedings
3. Large Area Electronics For Flat Panel Imagers - Progress And Challenges
Lu, J.P. ; Schuylenbergh, K. Van ; Ho, J. ; Wang, Y. ; Boyce, J.B. ; Street, R.A.
Pub. info.: Amorphous and heterogeneous silicon-based films - 2002 : symposium held April 2-5, 2002, San Francisco, California, U.S.A..  pp.649-660,  2002.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 715
4.

Conference Proceedings
Conference Proceedings
4. Inverse lithography technology at chip scale [6154-41]
Lin, B. ; Shieh, M. F. ; Sun, J. ; Ho, J. ; Wang, Y. ; Wu, X. ; Leitermann, W. ; Lin, O. ; Lin, J. ; Liu, Y. ; Pang, L.
Pub. info.: Optical Microlithography XIX.  pp.615414-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
5.

Conference Proceedings
Conference Proceedings
5. Real-world impacts of inverse lithography technology [5992-72]
Ho, J. ; Wang, Y. ; Wu, X. ; Xilinx Inc. (USA) ; Lin, B. ; Shieh, M. F. ; Sun, J. ; Lin, O. ; Lin, J. ; Liu, Y. ; Pang, L.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921Z-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992