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11 results

Conference Proceedings

1. Non-chemically amplified 248-nm resist materials

Willson,C.G. ; Yueh,W. ; Leeson,M.J. ; Steinhasler,T. ; McAdams,C.L. ; Dammel,R.R. ; Sounik,J.R. ; Aslam,M. ; Vicari,R. ; Sheehan,M.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.226-237, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

2. Photoresist materials:a historical perspective

Willson,C.G. ; Dammel,R.R. ; Reiser,A.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.28-41, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

3. Refractive indices in thick photoresist films as a function of bake conditions and film exposure

Ficner,S.A. ; Dammel,R.R. ; Perez,Y.M. ; Gardiner,A.B. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.838-849, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

4. Diffusivity measurements in polymers:II.Residual casting solvent measurement by liquid scintillation counting

Gardiner,A.B. ; Qin,A. ; Henderson,C.L. ; Pancholi,S. ; Koros,W.J. ; Willson,C.G. ; Dammel,R.R. ; Mack,C.A. ; Hinsberg,W.D.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.850-860, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

5. Diffusivity measurements in polymers:I.Lithographic modeling results

Mack,C.A. ; Mueller,K.E. ; Gardiner,A.B. ; Qin,A. ; Dammel,R.R. ; Koros,W.J. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.355-362, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

6. Photoresist materials:a historical perspective

Willson,C.G. ; Dammel,R.R. ; Reiser,A.

Pub. info.:	Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California. pp.28-41, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3048

Conference Proceedings

7. Bleaching-induced changes in the dispersion curves of DNQ photoresists

Henderson,C.L. ; Willson,C.G. ; Dammel,R.R. ; Synowicki,R.A.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.585-595, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

8. Photoresist characterization for lithography simulation:II.Exposure parameter measurements

Henderson,C.L. ; Pancholi,S. ; Chowdhury,S.A. ; Willson,C.G. ; Dammel,R.R.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.816-828, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

9. Photoresist characterization for lithography simulation:III.Development parameter measurements

Henderson,C.L. ; Tsiartas,P.C. ; Pancholi,S. ; Chowdhury,S.A. ; Dombrowski,K.D. ; Willson,C.G. ; Dammel,R.R.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.805-815, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

10.

Conference Proceedings

10. Photoresist materials:a historical perspective

Willson,C.G. ; Dammel,R.R. ; Reiser,A.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XI. pp.38-51, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3050

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