1.

Conference Proceedings
Conference Proceedings
1. Device and lithography contextual mask rule generation
Ham, Y. M. ; Dillon, B. ; Progler, C. ; Goldammer, K. ; Jin, Z. ; Green, G. ; Mackay, R. S. ; Divecha, H. ; Boksha, V. ; Martin, P. ; Heins, M. ; Zhang, Y. ; Davis, K. ; Marutyan, R. ; Martirosyan, K. ; Bakarian, S.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.319-330,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
2.

Conference Proceedings
Conference Proceedings
2. Mask cost analysis via write time estimation
Zhang, Y. ; Gray, R. ; Chou, S. ; Rockwell, B. ; Xiao, G. ; Kamberian, H. ; Cottle, R. ; Wolleben, A. ; Progler, C.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.313-318,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
3.

Conference Proceedings
Conference Proceedings
3. The effect of polarized 193nm irradiation on photomask haze formation
Kim, Y. D. ; Kang, H. B. ; Zhang, Y. ; Tran, C. ; Farrar, N. ; Qin, J. ; Rockwell, B. ; Cho, H. J. ; Cottle, R. ; Chan, D. ; Martin, P. ; Choi, S. S. ; Progler, C.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1586-1590,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
4.

Conference Proceedings
Conference Proceedings
4. Dynamic laser speckle in optical projection lithography: causes, effects on CDU and LER, and possible remedies
Jhaveri, T. ; Cottle, R. ; Zhang, Y. ; Progler, C.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.274-284,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
5.

Conference Proceedings
Conference Proceedings
5. Interaction and balance of mask write time and design RET strategies [5853-44]
Zhang, Y. ; Gray, R. ; Nakagawa, O. S. ; Gupta, P. ; Kamberian, H. ; Xiao, G. ; Cottle, R. ; Progler, C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.614-618,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853