1.

Conference Proceedings
Conference Proceedings
1. Burst assembly and scheduling mechanism for optical burst switching networks
Wu, G.L. ; Li, X.W. ; Chen, J.F. ; Chen, J.P.
Pub. info.: APOC 2002: Asia-Pacific Optical and Wireless Communications : optical networking II : 16-18 October 2002, Shanghai, China.  pp.318-323,  2002.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4910
2.

Conference Proceedings
Conference Proceedings
2. Crossing the divide between lithography and chip design(Invited Paper)
Arnold, W.H. ; Chen, J.F. ; Wampler, K.E.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.243-253,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
3.

Conference Proceedings
Conference Proceedings
3. Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
Petersen, J.S. ; Conley, W. ; Roman, B.J. ; Litt, L.C. ; Lucas, K. ; Wu, W. ; Van Den Broeke, D.J. ; Chen, J.F. ; Laidig, T.L. ; Wampler, K.E. ; Gerold, D.J. ; Maslow, M.J. ; Socha, R.J. ; van Praagh, J. ; Droste, R.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.298-311,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
4.

Conference Proceedings
Conference Proceedings
4. Patterning half-wavelength DRAM cell using chromeless phase lithography (CPL)
Hsu, C. ; Chu, R. ; Chen, J.F. ; Van Den Broeke, D.J. ; Shi, X. ; Hsu, S.D. ; Wang, T.
Pub. info.: Optical Microlithography XV.  Part One  pp.76-88,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
Hsu, S.D. ; Corcoran, N.P. ; Eurlings, M. ; Knose, W.T. ; Laidig, T.L. ; Wampler, K.E. ; Roy, S. ; Shi, X. ; Hsu, C.M. ; Chen, J.F. ; Finders, J. ; Socha, R.J. ; Dusa, M.V.
Pub. info.: Optical Microlithography XV.  Part One  pp.476-490,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
6.

Conference Proceedings
Conference Proceedings
6. Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
Petersen, J.S. ; Conley, W. ; Roman, B.J. ; Litt, L.C. ; Lucas, K. ; Wu, W. ; Van Den Broeke, D.J. ; Chen, J.F. ; Laidig, T.L. ; Wampler, K.E. ; Gerold, D.J. ; Socha, R.J. ; van Praagh, J. ; Droste, R.
Pub. info.: Optical Microlithography XV.  Part One  pp.515-529,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
7.

Conference Proceedings
Conference Proceedings
7. Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology
Socha, R.J. ; Van Den Broeke, D.J. ; Yu, L. ; Conley, W. ; Wu, W. ; Chen, J.F. ; Petersen, J.S. ; Gerold, D.J. ; van Praagh, J. ; Droste, R. ; Flagello, D.G. ; Hsu, S.D.
Pub. info.: Optical Microlithography XV.  Part One  pp.446-458,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
8.

Conference Proceedings
Conference Proceedings
8. Mesa or trench type for chromeless phase-shift lithography from photolithographic performance point of view
Shi, X. ; Chen, J.F. ; Hsu, S. ; Van Den Broeke, D.J. ; Socha, R.J. ; Chang, C.H. ; Dai, C.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1304-1312,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
9.

Conference Proceedings
Conference Proceedings
9. Tuning MEEF for CD control at 65-nm node based on chromeless phase lithography (CPL)
Van Den Broeke, D.J. ; Laidig, T.L. ; Wampler, K.E. ; Hsu, S. ; Shi, X. ; Hsu, M. ; Burchard, P. ; Chen, J.F.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.579-591,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
10.

Conference Proceedings
Conference Proceedings
10. Application of Cr-less mask technology for sub-100-nm gate with single exposure
Kim, S.-H. ; Chung, D.-H. ; Park, J.S.. ; Shin, I.K. ; Choi, S.W. ; Sohn, J.-M. ; Lee, J.-H. ; Shin, H.-S. ; Chen, J.F. ; Van Den Broeke, D.J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.568-578,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889