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11 results

Conference Proceedings

1. Surface Delamination of an Injection Molded Medical Device Using Flexible PVC

Yang, T. ; Shang, S. ; Booras, J. ; Ling, M. T. K. ; Blom, H. ; Woo, L. ; Jin, H. -S. ; Marcquenski, D.

Pub. info.:	ANTEC 2000 Conference proceedings, May 7-11, 2000, Orlando, Florida. pp.3213-3216, 2000. Brookfield Center, CT. Society of Plastics Engineers, Inc. (SPE)
Title of ser.:	Annual Technical Conference - ANTEC : Society of Plastics Engineers Annual Technical Papers
Ser. no.:	46

Conference Proceedings

2. Effect of Electron Beam Irradiation on Medical Packaging Materials

Shang, S. ; Yang, T. ; Sandford, C. ; Ling, M. T. K. ; Woo, L.

Pub. info.:	ANTEC 2000 Conference proceedings, May 7-11, 2000, Orlando, Florida. pp.2740-2745, 2000. Brookfield Center, CT. Society of Plastics Engineers, Inc. (SPE)
Title of ser.:	Annual Technical Conference - ANTEC : Society of Plastics Engineers Annual Technical Papers
Ser. no.:	46

Conference Proceedings

3. Lithography yield enhancement through optical rule checking

Word V, J. C. ; Torres, J. A. ; Roessler, T. ; Lafferty, N. ; Shang, S.

Pub. info.:	Advanced microlithography technologies : 8-10 November, 2004, Beijing, China. pp.142-153, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5645

Conference Proceedings

4. Optical properties of Al2O3 and MgF2 coatings deposited by electron-beam evaporation in the DUV/VUV spectral range

Shang, S. ; Yi, K. ; Huang, J. ; Shao, J. ; Fan, Z.

Pub. info.:	Fifth International Conference on Thin Film Physics and Applications : 31 May-2 June, 2004, Shanghai, China. pp.385-388, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5774

Conference Proceedings

5. The influence of calibration pattern coverage for lumped parameter resist models on OPC convergence [6156-50]

Niehoff, M. ; Shang, S. ; Toublan, O.

Pub. info.:	Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA. pp.615619-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6156

Conference Proceedings

6. Thermal Characterization for Radiation Treated Medical Products

Shang, S. ; Yang, T. ; Woo, L. ; Sandford, C.

Pub. info.:	ANTEC 2004, 62nd annual technical conference, Chicago, IL, May 16-20, 2004. pp.3685-3689, 2004. Brookfield Center, Conn.. Society of Plastics Engineers
Title of ser.:	Annual Technical Conference - ANTEC : Society of Plastics Engineers Annual Technical Papers
Ser. no.:	62

Conference Proceedings

7. Integrated post tape outflow for fast design to mask turn-around time [5992-172]

Hung, C. -Y. ; Liu, Q. ; Zhang, L. ; Shang, S. ; Bailey, G. E. ; Jost, A. ; Brist, T.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.599251-599251, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

8. On objectives and algorithms of inverse methods in microlithography [6349-184]

Granik, Y. ; Sakajiri, K. ; Shang, S.

Pub. info.:	Photomask Technology 2006. pp.63494R-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

9. Lithography process related OPC development and verification demonstration on a sub-9Onm poly layer [5853-52]

Hung, C.-Y. ; Liu, Q. ; Zhang, L. ; Shang, S. ; Jost, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.678-685, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

10.

Conference Proceedings

10. Minimizing yield-loss risks through post-OPC verification [6349-180]

Wang, C. ; Liu, Q. ; Zhang, L. ; Gao, G.-S. ; Brist, T. E. ; Donnelly, T. ; Shang, S.

Pub. info.:	Photomask Technology 2006. pp.63494N-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

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