1.

Conference Proceedings
Conference Proceedings
1. IMPACT OF THE ELECTROCHEMICAL PROPERTIES OF SILICON WAFER SURFACES ON COPPER OUTPLATING FROM HF SOLUTIONS
Teerlinck, I. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Hurd, T.Q. ; Mouche, L. ; Mertens, P.W. ; Meuris, M. ; Heyns, M.M. ; Vanhaeren, D. ; Vandervorst, W.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.284-291,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
2.

Conference Proceedings
Conference Proceedings
2. METAL INTERACTIONS WITH SILICA (SiO2) SURFACES: ADSORPTION AND ION EXCHANGE
Hurd, T.Q. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Mertens, P.W. ; Hall, L.H. ; Heyns, M.M.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.277-283,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
3.

Conference Proceedings
Conference Proceedings
3. DETERMINATION OF THE H-PASSIVATION BUILD-UP TIME IN DHF-TREATMEN
Meuris, M. ; Izumi, H. ; Kubo, K. ; Ojima, S. ; Ohmi, T. ; Heyns, M.M.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.444-448,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
4.

Conference Proceedings
Conference Proceedings
4. IN SITU AND REAL TIME STUDIES OF WET CHEMICAL SILICON SURFACE CLEANING REACTIONS
Schmidt, H.F. ; Teerlinck, I. ; Storm, W. ; Bender, H. ; Heyns, M.M.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.480-491,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
5.

Conference Proceedings
Conference Proceedings
5. The impact of Fe and Cu on the minority carrier lifetime of p and n-type silicon wafers
Simoen, E. ; Heyns, M.M. ; Claeys, C. ; Brown, G.
Pub. info.: ALTECH 95 : analytical techniques for semiconductor materials and process characterization II : proceedings of the Satellite Symposium to ESSDERC 95, The Hague, The Netherlands.  pp.54-63,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-30
6.

Conference Proceedings
Conference Proceedings
6. COMPARISON OF HC1 GAS-PHASE CLEANING WITH CONVENTIONAL AND DILUTE WET CHEMISTRIES
Elsmore, C. ; Hurd, T.Q. ; Clarke, J. ; Meuris, M. ; Mertens, P.W. ; Heyns, M.M.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.142-149,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
7.

Conference Proceedings
Conference Proceedings
7. In-situ and real time characterization of wet chemical silicon surface processes by electrochemical open circuit potential measurements
Schmidt, H.F ; Teerlinck, I. ; Meuris, M. ; Mertens, P.W. ; Heyns, M.M.
Pub. info.: ALTECH 95 : analytical techniques for semiconductor materials and process characterization II : proceedings of the Satellite Symposium to ESSDERC 95, The Hague, The Netherlands.  pp.316-328,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-30
8.

Conference Proceedings
Conference Proceedings
8. DEVELOPMENT OF ADVANCED CORROSION FREE ORGANIC STRIPPERS FOR ULSI PROCESSING
Rotondaro, A.L.P. ; Honda, K. ; Maw, T. ; Perry, D. ; Lux, M. ; Heyns, M.M. ; Claeys, C. ; Darakchiev, I.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.537-543,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20