1.

Conference Proceedings
Conference Proceedings
1. 0.35 um and sub-0.35 um Matal Stack Etch in a DPS Chamber - DPS Chamber and Process Characterization
Ye, Y. ; Ma, D. ; Hanawa, H. ; Loewenhardt, P. ; Zhao, A. ; Shiau, J. ; Yan, C. ; Webb, T. ; Mak, S. ; Papanu, J. ; Yin, G.
Pub. info.: Proceedings of the eleventh International Symposium on Plasma Processing.  pp.222-233,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-12
2.

Conference Proceedings
Conference Proceedings
2. Aspect Ratio Dependent Etching(ARDE) Investigation in High Den- sity Metal Etch Applications
Ma, D.X. ; Webb, T.R. ; Zhao, A. ; Hwang, Z. ; Tajima, D. ; Loewenhardt, P.K.
Pub. info.: Proceedings of the eleventh International Symposium on Plasma Processing.  pp.250-258,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-12