1.

Technical Paper
Technical Paper
1. Moon Tracking Attitude Control Experiment of a Controlled Bias Momentum Micro Satellite
Terui, F. ; Kimura, S. ; Nagai, Y. ; Yamamoto, H. ; Yoshihara, K. ; Yamamoto, T. ; Nakasuka, S.
Pub. info.: AIAA meeting papers on disc.  2005.  [Reston, Va.].  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : AIAA Guidance Navigation and Control Conference
Ser. no.: 2005
2.

Technical Paper
Technical Paper
2. Single Event Performance of a COTS Processor
Kimura, S. ; Nagai, Y. ; Yamamoto, H. ; Hashimoto, H. ; Takahashi, N. ; Yoshihara, K.
Pub. info.: AIAA meeting papers on disc.  2004.  [Reston, Va.].  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : AIAA International Communications Satellite Systems Conference
Ser. no.: 22nd
3.

Conference Proceedings
Conference Proceedings
3. Airborne contamination control for 157-nm lithography: influence of ammonia contamination
Matsui, H. ; Kitano, J. ; Yoshihara, K. ; Kawaguchi, E. ; Furukawa, T. ; Matsunaga, K. ; Itani, T. ; Fujii, K.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1074-1081,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
4.

Conference Proceedings
Conference Proceedings
4. Critical dimension control in 90nm - 65nm node
Terashita, Y. ; Shizukuishi, M. ; Shite, H. ; Kyoda, H. ; Oshima, K. ; Yoshihara, K.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1264-1273,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
5.

Conference Proceedings
Conference Proceedings
5. Improvement of CD controllability in developer process
Kyoda, H. ; Okouchi, A. ; Takeguchi, H. ; Kim, H.W. ; Yamamoto, T. ; Yoshihara, K.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1353-1365,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
6.

Conference Proceedings
Conference Proceedings
6. Critical dimension (CD) control in 157-nm lithography
Hori, S. ; Yoshihara, K. ; Kyoda, H. ; Matsui, H. ; Furukawa, T. ; Miyoshi, S. ; Kawaguchi, E. ; Itani, T.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1333-1342,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
7.

Conference Proceedings
Conference Proceedings
7. Behavior and control of resist dissolution in the development process
Takai, Y. ; Mulhall, J. ; Yoshihara, K. ; Kyoda, H. ; Takeguchi, H.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.929-935,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690