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Conference Proceedings

1. Combination of OPC and AttPSM for patterning sub-0.18-ｦﾌm logic devices

Kuo,H.J. ; Lin,C.H. ; Tzu,S.D. ; Yen,A.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.435-445, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

2. Sub-0.18-ｦﾌm line/space lithography using 248-nm scanners and assisting feature OPC masks

Lin,H.T. ; Lin,J.C.H. ; Chiu,C.S.G. ; Wang,Y.Y. ; Yen,A.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.307-315, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

3. Study of pupil filters for depth of focus enhancement in printing contact holes

Wang,C.-M. ; Yu,S.-S. ; Yen,A.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.783-791, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679