1.

Conference Proceedings
Conference Proceedings
1. Thermal Stability of Electrodeposited Copper Interconnect with Low-K Films
Lee, S. ; Lee, K.-W. ; Yang, S.-H. ; Kim, Y.-A. ; Oh, K. ; Park, J.-W.
Pub. info.: Low and High Dielectric Constant Materials : Materials Science, Processing, and Reliability Issues, proceedings of the fourth International Symposium and Thin Film Materials for Advanced Packaging Technologies : proceedings of the second International Symposium.  pp.69-78,  1999.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-7
2.

Conference Proceedings
Conference Proceedings
2. A New Local Electronic Stopping Model for the Monte Carlo Simulation of Arsenic Ion Implantation into (100) Single-Crystal Silicon
Yang, S.-H. ; Morris, S. ; Tian, S. ; Parab, K. ; Tasch, A. F. ; Echenique, P. M. ; Capaz, R. ; Joannopoulos, J.
Pub. info.: Modeling and simulation of thin-film processing : symposium held April 17-20, 1995, San Francisco, California, U.S.A..  pp.77-,  1995.  Pittsburgh.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 389
3.

Conference Proceedings
Conference Proceedings
3. An Accurate Monte Carlo Binary Collision Model for BF2 Implants into (100) Single-Crystal Silicon
Yang, S.-H. ; Morris, S. ; Tian, S. ; Morris, M. ; Parab, K. ; Obradovich, B. ; Tasch, A.
Pub. info.: Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology.  pp.481-495,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-4
4.

Conference Proceedings
Conference Proceedings
4. A Two-Dimensional, Accurate and Computationally Efficient Model for Boron Implantation through Oxide Layers into Silicon
Morris, S. ; Lim, D. ; Yang, S.-H. ; Tian, S. ; Parab, K. ; Tasch, A.F.
Pub. info.: Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology.  pp.468-480,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-4