1.

Conference Proceedings
Conference Proceedings
1. First microprocessors with immersion lithography
Lee, D.-Y. ; Kim, I.-S. ; Jung, S.-G. ; Jung, M.-H. ; Park, J.-O. ; Oh, S.-H. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.119-128,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Water distribution within immersed polymer films
Kang, Y. ; Hong, J. ; Lee, S.-Y. ; Lee, H.-R. ; Ryoo, M.-H. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.31-39,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
3.

Conference Proceedings
Conference Proceedings
3. Requirement of in-field illumination control for low k1 imaging below 0.3
Hwang, C. ; Shin, J. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1548-1556,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
4.

Conference Proceedings
Conference Proceedings
4. One small step: world's first integrated EUVL process line
Kim, S.-S. ; Chalyck, R. ; Woo, S.-G. ; Cho, H.-K.
Pub. info.: Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA.  pp.64-77,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5751