1.

Conference Proceedings
Conference Proceedings
1. Implementation of the ArF resists based on VEMA for sub-100-nm device
Kim, H.-W. ; Lee, S. ; Choi, S.-J. ; Lee, S.-H. ; Kang, Y. ; Woo, S.-G. ; Nam, D.S. ; Chae, Y.-S. ; Kim, J.S. ; Moon, J.-T. ; Kavanagh, R.J. ; Barclay, G.G.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.533-540,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. Fluorocarbon-based single-layer resist for 157-nm lithography
Song, K.Y. ; Yoon, K.-S. ; Choi, S.-J. ; Woo, S.-G. ; Han, W.-S. ; Lee, J.-J. ; Lee, S.-K. ; Noh, C.-H. ; Honda, K.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.504-511,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
3.

Conference Proceedings
Conference Proceedings
3. Measurement of the flare and in-field linewidth variation due to the flare
Jeong, T.M. ; Choi, S.-W. ; Woo, S.-G. ; Han, W.-S. ; Sohn, J.-M.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1465-1473,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. Novel surface silylation process for chemically amplified photoresist
Lee, S.-H. ; Hong, J. ; Woo, S.-G. ; Cho, H.-G. ; Han, W,-S.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.1005-1012,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690