1.

Conference Proceedings
Conference Proceedings
1. Statistical measure for the sharpness of SEM images
Zhang,N.F. ; Postek,M.T. ; Larrabee,R.D. ; Vladar,A.E. ; Keery,W.J. ; Jones,S.N.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.375-387,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050
2.

Conference Proceedings
Conference Proceedings
2. Fourier transform feedback tool for scanning electron microscopes used in semiconductor metrology
Postek,M.T. ; Vladar,A.E. ; Davidson,M.P.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.68-79,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050