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Conference Proceedings

1. High-accuracy critical-dimension metrology using a scanning electron microscope

Lowney,J.R. ; Vladar,A.E. ; Postek,M.T.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography X. pp.515-526, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2725

Conference Proceedings

2. SEM performance evaluation using the sharpness criterion

Postek,M.T. ; Vladar,A.E.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography X. pp.504-514, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2725