1.

Conference Proceedings
Conference Proceedings
1. A 65-nm node SRAM solution using alt-PSM with ArF lithography
Driessen, F.A. ; Zawadzki, M.T. ; Krishnan, P.R. ; Balasinski, A. ; Vandenberghe, G.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.224-234,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
2.

Conference Proceedings
Conference Proceedings
2. Through-pitch low-k1 contact hole imaging with CPL technology
Wiaux, V. ; Bekaert, J. ; Chen, J.F. ; Hsu, S.D. ; Ronse, K.G. ; Socha, R.J. ; Vandenberghe, G. ; Van Den Broeke, D.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.585-594,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
3.

Conference Proceedings
Conference Proceedings
3. Gray assist bar OPC
Lafferty, N.V. ; Vandenberghe, G. ; Smith, B.W. ; Lassiter, M. ; Martin, P.M.
Pub. info.: Optical Microlithography XVII.  pp.381-392,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
4.

Conference Proceedings
Conference Proceedings
4. Optical extensions towards the 45-nm node
Hendrickx, E. ; Monnoyer, P. ; Van Look, L. ; Vandenberghe, G.
Pub. info.: Optical Microlithography XVII.  pp.357-368,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
5.

Conference Proceedings
Conference Proceedings
5. Experimental verification of a model-based decomposition method for double dipole lithography
Eurlings, M. ; Hsu, S.D. ; Hendrickx, E. ; op 't Root, W. ; Laidig, T.L. ; Chiou, T.-B. ; Chen, A. ; Chen, F. ; Vandenberghe, G. ; Finders, J.
Pub. info.: Optical Microlithography XVII.  pp.1225-1236,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
6.

Conference Proceedings
Conference Proceedings
6. Mask topography effect in chromeless phase lithography
Philipsen, V. ; Bekaert, J. ; Vandenberghe, G. ; Jonckheere, R. ; Van Den Broeke, D. ; Socha, R.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.669-679,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567