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Conference Proceedings

1. Phase aware proximity correction for advanced masks

Toublan,O. ; Sahouria,E.Y. ; Cobb,N.B. ; Do,T. ; Donnelly,T. ; Granik,Y. ; Schellenberg,F.M. ; Schiavone,P.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.160-170, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

2. OPC beyond 0.18 ｦﾌm:OPC on PSM gates

Schellenberg,F.M. ; Toublan,O. ; Cobb,N.B. ; Sahouria,E.Y. ; Hughes,G.P. ; MacDonald,S.S. ; West,C.A.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1062-1069, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

3. Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections

Capodieci,L. ; Torres,J.A. ; Socha,R.J. ; Hollerbach,U. ; Chen,J.F. ; Os,C.van ; Granik,Yu. ; Toublan,O. ; Cobb,N.B.

Pub. info.:	Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA. pp.58-67, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4181

Conference Proceedings

4. New process monitor for reticles and wafers:the MEEF meter

Schellenberg,F.M. ; LaCour,P. ; Toublan,O. ; Anderson,G. ; Yip,R.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.187-194, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

5. Fully automatic side lobe detection and correction technique for attenuated phase-shift masks

Toublan,O. ; Cobb,N.B. ; Sahouria,E.Y.

Pub. info.:	Optical Microlithography XIV. 4346 pp.1541-1547, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

6. Phase and transmission errors aware OPC solution for PSM: feasability demonstration

Toublan,O. ; Sahouria,E.Y. ; Cobb,N.B.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.862-868, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

Conference Proceedings

7. Subresolution process windows and yield estimation technique based on detailed full-chip CD simulation

Granik,Yu. ; Cobb,N.B. ; Sahouria,E.Y. ; Toublan,O. ; Capodieci,L. ; Socha,R.J.

Pub. info.:	Process Control and Diagnostics. pp.335-341, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4182

Conference Proceedings

8. (Sub-) 100-nm gate patterning using 248-nm alternating PSM

Vandenberghe,G.N. ; Jaenen,P. ; Jonckheere,R.M. ; Ronse,K. ; Toublan,O.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.61-69, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

Conference Proceedings

9. Leap ahead in mask data processing for technology nodes below 130nm

Miramond,C. ; Goubier,D. ; Chomat,M. ; Trouiller,Y. ; Rody,Y.F. ; Toublan,O.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.721-726, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

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Conference Proceedings

10. Adjustment of optical proximity correction (OPC) software for mask process correction (MPC). Module 1: Optical mask writing tool simulation

Barberet,A. ; Fanget,G.L. ; Buck,P.D. ; Toublan,O. ; Richoilley,J.-C. ; Tissier,M.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.511-521, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

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