1.

Conference Proceedings
Conference Proceedings
1. Reducing or eliminating line-end shortening and iso/dense bias by tuning NA and sigma
Toublan,O. ; Schiavone,P.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.912-920,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Flare impact on the intrafield CD control for sub-0.25-ｦﾌm patterning
Luce,E. ; Minghetti,B. ; Schiavone,P. ; Toublan,O. ; Weill,A.P.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.368-381,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. New approach to PEB mechanisms in novolac-DNQ resists:influence of physical and viscoelastic properties
Toublan,O. ; Peloso,H. ; Prola,A. ; Paniez,P.J.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.345-354,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
4.

Conference Proceedings
Conference Proceedings
4. Application of a new approach to optical proximity correction
Rosenbusch,A. ; Hourd,A.C. ; Juffermans,C.A. ; Kirsch,H. ; Lalanne,F.P. ; Maurer,W. ; Romeo,C. ; Ronse,K. ; Schiavone,P. ; Simecek,M. ; Toublan,O. ; Vermeuien,T. ; Watson,J.C. ; Ziegler,W.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.639-647,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
5.

Conference Proceedings
Conference Proceedings
5. New approach to optical proximity correction
Rosenbusch,A. ; Juffermans,A.H. ; Kirsch,H. ; Lalanne,F.P. ; Maurer,W. ; Romeo,C. ; Ronse,K. ; Schiavone,P. ; Simecek,M. ; Toublan,O. ; Watson,J.C. ; Ziegler,W. ; Zimmermann,R.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.585-593,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546