1.

Conference Proceedings
Conference Proceedings
1. Mask blank particle inspection in vacuum environments
Sekine, A. ; Nagahama, H. ; Tojo, T. ; Akeno, K. ; Hirano, R.
Pub. info.: Optomechatronic systems III : 12-14 November 2002, Stuttgart, Germany.  pp.624-631,  2002.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4902
2.

Conference Proceedings
Conference Proceedings
2. A novel integrated catadioptric pick-up with ferrofluid cooling structure
Yamanaka, K. ; Okuda, T. ; Tojo, T. ; Ijima, S. ; Onozawa, K. ; Ueda, D. ; Kubo, J. ; Kitagawa, S.
Pub. info.: Advanced optical and quantum memories and computing : 27-28 January 2004, San Jose, California, USA.  pp.90-98,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5362
3.

Conference Proceedings
Conference Proceedings
3. Reduction of Stacking Faults in Fast Epitaxial Growth of 4H-SiC and its Impacts on High-Voltage Schottky Diodes
Fujiwara, H. ; Kimoto, T. ; Tojo, T. ; Matsunami, H.
Pub. info.: Silicon carbide and related materials 2004 : ECSCRM 2004 : proceedings of the 5th European Conference on Silicon Carbide and Related Materials, August 31 - September 4 2004, Bologna, Italy.  pp.151-154,  2005.  Uetikon-Zuerich.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 483-485
4.

Conference Proceedings
Conference Proceedings
4. Surface Treatment of SiC using NF3/O2 Plasmas
Kai, T.J ; Shimizu, W. ; Hibi, A. ; Iwase, T. ; Abe, T. ; Inaba, M. ; Ogumi, Z. ; Tojo, T. ; Tasaka, A.
Pub. info.: Plasma processing XIV : proceedings of the international symposium.  pp.84-91,  2002.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-17
5.

Conference Proceedings
Conference Proceedings
5. Electrolytic Synthesis of Perfluorotrimethylamine with Alkali Metal Fluroide Contained Carbon Anode
Tasaka, A. ; Miyasaka, A. ; Miyazaki, T. ; Takebayashi, H. ; Tojo, T. ; Momota, K.
Pub. info.: Molten Salts XIII : proceedings of the international symposium.  pp.937-945,  2002.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-19
6.

Conference Proceedings
Conference Proceedings
6. Fast Epitaxial Growth of Thick 4H-SiC with Specular Surface by Chimney-Type Vertical Hot-Wall Chemical Vapor Deposition
Fujiwara, H. ; Danno, K. ; Kimoto, T. ; Tojo, T. ; Matsunami, H.
Pub. info.: Silicon carbide and related materials 2003 : ICSCRM, 2003 : proceedings of the 10th International Conference on Silicon Carbide and Related Materials 2003, Lyon, France, October 5-10, 2003.  pp.205-208,  2004.  Uetikon-Zuerich.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 457-460
7.

Conference Proceedings
Conference Proceedings
7. Lens-cementing technology used in optical system of DUV wavelength region: selection of optical cement and degradation evaluation by DUV irradiation [6152-149]
Takahashi, T. ; Saito, S. ; Okumura, T. ; Suzuki, E. ; Kojima, T. ; Motomiya, S. ; Maruyama, H. ; Suzuki, H. ; Machida, K. ; Tojo, T.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61523P-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
8.

Conference Proceedings
Conference Proceedings
8. Optical mask inspection strategy for 65-nm node and beyond
Chung, D.-H.P. ; Ohira, K. ; Yoshioka, N. ; Matsumura, K. ; Tojo, T. ; Otaki, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.320-329,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
9.

Conference Proceedings
Conference Proceedings
9. Performance of novel 198.5-nm wavelength mask inspection system for 65-nm node and beyond optical lithography era
Chung, D. -H. ; Ohira, K. ; Yoshioka, N. ; Matsumura, K. ; Tojo, T. ; Otaki, M.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.993-1004,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
10.

Conference Proceedings
Conference Proceedings
10. Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance
Tojo, T. ; Hirano, R. ; Tsuchiya, H. ; Oaki, J. ; Nishizaka, T. ; Sanada, Y. ; Matsuki, K. ; Isomura, I. ; Ogawa, R. ; Kobayashi, N. ; Nakashima, K. ; Sugihara, S. ; Inoue, H. ; Imai, S. ; Suzuki, H. ; Sekine, A. ; Taya, M. ; Miwa, A. ; Yoshioka, N. ; Ohira, K. ; Chung, D. -H. ; Otaki, M.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1011-1023,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567