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Fundamentals of novel oxide/semiconductor interfaces : symposium held December 1-4, 2003, Boston, Massachusetts, U.S.A.. pp.95-102, 2004. Warrendale, Pa.. Materials Research Society
Stehle, J. L. ; Piel, J. P. ; Campillo-Carreto, J.
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Metrology, Inspection, and Process Control for Microlithography XX. pp.615233-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Stehle, J. L. ; Piel, J. P ; Campillo, J. ; Zahorski, D. ; Giovannini, H.
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Metrology, Inspection, and Process Control for Microlithography XX. pp.61522Z-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering