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17 results

Conference Proceedings

1. 0.11-μm imaging in KrF lithography using dipole illumination

Eurlings,M. ; Setten,E.van ; Torres,J.A. ; Dusa,M.V. ; Socha,R.J. ; Capodieci,L. ; Finders,J.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.266-278, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

2. KrF lithography for 130 nm

Finders,J. ; Schoot,J.B.van ; Vanoppen,P. ; Dusa,M.V. ; Socha,R.J. ; Vandenberghe,G. ; Ronse,K.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.192-205, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

3. Modeling oblique incidence effects in photomasks

Pistor,T.V. ; Neureuther,A.R. ; Socha,R.J.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.228-237, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

4. Dual damascene photo process using negative-tone resist

Shi,X. ; Fung,A.C. ; Hsu,S. ; Li,Z. ; Nguyen,T. ; Socha,R.J. ; Conley,W.E. ; Dusa,M.V.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part2 pp.835-842, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

5. Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections

Capodieci,L. ; Torres,J.A. ; Socha,R.J. ; Hollerbach,U. ; Chen,J.F. ; Os,C.van ; Granik,Yu. ; Toublan,O. ; Cobb,N.B.

Pub. info.:	Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA. pp.58-67, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4181

Conference Proceedings

6. Forbidden pitches for 130-nm lithography and below

Socha,R.J. ; Dusa,M.V. ; Capodieci,L. ; Finders,J. ; Chen,J.F. ; Flagello,D.G. ; Cummings,K.D.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1140-1155, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

7. Understanding the impact of full-field mask error factor

Conley,W.E. ; Shi,X. ; Hankinson,M. ; Dusa,M.V. ; Socha,R.J. ; Garza,C.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.580-587, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

8. Comparison of OPC rules and common process windows for 130-nm features using binary and attenuated phase-shift masks

Reilly,M.T. ; Parker,C. ; Kvam,K. ; Socha,R.J. ; Dusa,M.V.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1209-1222, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

9. Design and analysis of across-chip linewidth variation for printed features at 130 nm and below

Chen,J.F. ; Socha,R.J. ; Puntambekar,K. ; Wampler,K.E. ; Caldwell,R.F. ; Dusa,M.V. ; Love,J.C. ; Yeric,G. ; Stoner,B.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.168-177, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

10.

Conference Proceedings

10. The MEEF shall inherit the Earth

Conley,W. ; Garza,C.M. ; Dusa,M.V. ; Socha,R.J. ; Bendik,J.J. ; Mack,C.A.

Pub. info.:	Optical Microlithography XIV. 4346 pp.251-258, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

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