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10 results

Conference Proceedings

1. CD control comparison for sub-0.18-ｦﾌm patterning using 248-nm lithography and strong resolution enhancement techniques

Vandenberghe,G. ; Marschner,T. ; Ronse,K. ; Socha,R.J. ; Dusa,M.V.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.228-238, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

2. CD error sensitivity to "sub-killer" defects at k1 near 0.4:II

Nakagawa,K.H. ; Chen,J.F. ; Socha,R.J. ; Dusa,M.V. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Broeke,D.J.van den

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.893-904, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

3. Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node

Petersen,J.S. ; McCallum,M. ; Kachwala,N. ; Socha,R.J. ; Chen,J.F. ; Laidig,T.L. ; Smith,B.W. ; Gordon,R.L. ; Mack,C.A.

Pub. info.:	Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.73-89, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3741

Conference Proceedings

4. Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask:?.Experimental results

Socha,R.J. ; Shi,X. ; Holman,K.C. ; Dusa,M.V. ; Conley,W. ; Petersen,J.S. ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Chu,M.C. ; Su,C. ; Huang,K. ; Chen,C. ; Le,C. ; Pierrat,C. ; Su,B.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.38-54, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

5. Simulating photomask edge roughness and corner rounding

Adam,K. ; Socha,R.J. ; Pistor,T. ; Neureuther,A.R.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XI. pp.215-223, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3050

Conference Proceedings

6. Effect of the partial coherence on reflective notching

Socha,R.J. ; Progler,C.J. ; Neureuther,A.R.

Pub. info.:	Optical Microlithography X. pp.479-490, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3051

Conference Proceedings

7. Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography

Petersen,J.S. ; Socha,R.J. ; Naderi,A.R. ; Baker,C.A. ; Rizvi,S.A. ; BanDenBroeke,D. ; Kachwala,N. ; Chen,F. ; Laiding,S. ; Wampler,K.E. ; Caldwell,R.F. ; Takeuchi,S. ; Yamada,Y. ; Senoh,T. ; McCallum,M.

Pub. info.:	Photomask and X-Ray Mask Technology V. pp.503-520, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3412

Conference Proceedings

8. Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation:I

Socha,R.J. ; Petersen,J.S. ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F.

Pub. info.:	18th Annual BACUS Symposium on Photomask Technology and Management. pp.617-641, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3546

Conference Proceedings

9. Effect of reticle CD uniformity on wafer CD uniformity in the presence of scattering-bar optical proximity correction

Adam,K. ; Socha,R.J. ; Dusa,M.V. ; Neureuther,A.R.

Pub. info.:	18th Annual BACUS Symposium on Photomask Technology and Management. pp.642-650, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3546

10.

Conference Proceedings

10. Assessment of a hypothetical roadmap that extends optical lithography through the 70-nm technology node

Petersen,J.S. ; McCallum,M. ; Kachwala,N. ; Socha,R.J. ; Chen,J.F. ; Laidig,T.L. ; Smith,B.W. ; Gordon,R.L. ; Mack,C.A.

Pub. info.:	18th Annual BACUS Symposium on Photomask Technology and Management. pp.288-303, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3546

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