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12 results

Conference Proceedings

1. The impact of scanner model vectorization on optical proximity correction

J. K. Tyminski ; T. Nakashima ; Q. Zhang ; T. Matsuyama ; K. Lucas

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

2. Efficient post-OPC lithography hotspot detection using a novel OPC correction and verification flow

Q. Zhang ; P. VanAdrichem ; K. Lucas

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

3. Analysis of OPC optical model accuracy with detailed scanner information

L. Zavyalova ; K. Lucas ; Q. Zhang ; Y. Fan ; S. Sethi

Pub. info.:	Optical Microlithography XXI. 1 pp.69241D-1-69241D-12, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6924

Conference Proceedings

4. Modeling mask pellicle effects for OPC/RET

L. Zavyalova ; H. Song ; K. Lucas ; Q. Zhang ; J. Shiely

Pub. info.:	Photomask and next-generation lithography mask technology XV. 2 pp.70283B-1-70283B-12, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7028

Conference Proceedings

5. Hybrid resist model to enhance continuous process window model for OPC

Q. Zhang ; K. Lucas

Pub. info.:	Photomask and next-generation lithography mask technology XV. 1 pp.70280L-1-70280L-10, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7028

Conference Proceedings

6. Rigorous vectorial modeling for polarized illumination and projection pupil in OPC

Q. Zhang ; H. Song ; K. Lucas ; B. Ward ; J. Shiely

Pub. info.:	Photomask and next-generation lithography mask technology XV. 1 pp.702813-1-702813-11, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7028

Conference Proceedings

7. Modeling of focus blur in the context of optical proximity correction

Q. Zhang ; H. Song ; K. Lucas ; J. Shiely

Pub. info.:	Optical Microlithography XXI. 3 pp.69243K-1-69243K-9, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6924

Conference Proceedings

8. Focus blur model to enhance lithography model for optical proximity correction

Q. Zhang ; H. Song ; K. Lucas

Pub. info.:	Photomask technology 2008. 2 pp.71223Y-1-71223Y-9, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7122

Conference Proceedings

9. Polarization aberration modeling via Jones matrix in the context of OPC

Q. Zhang ; H. Song ; K. Lucas

Pub. info.:	Photomask technology 2007. 1 pp.67301Q-1-67301Q-11, 2007. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6730

10.

Conference Proceedings

10. Modeling scanner signatures in the context of OPC

Q. Zhang ; J. K. Tyminski ; K. Lucas

Pub. info.:	Photomask technology 2007. 3 pp.673056-1-673056-12, 2007. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6730

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