1.

Conference Proceedings
Conference Proceedings
1. Evaluation of the critical dimension control requirements in the ITRS using statistical simulation and error budgets
Hector, S.D. ; Postnikov, S.V. ; Cobb, J.
Pub. info.: Optical Microlithography XVII.  pp.555-570,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
2.

Conference Proceedings
Conference Proceedings
2. MEV as a new constraint for lithographers in the sub-100-nm regime
Trouiller, Y. ; Postnikov, S.V. ; Lucas, K.D. ; Sundermann, F. ; Patterson, K. ; Belledent, J. ; Couderc, C. ; Rody, Y.F.
Pub. info.: Optical Microlithography XVII.  pp.1081-1092,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377