1.

Conference Proceedings
Conference Proceedings
1. Lithographic process window analysis by statistical means
Bourov, A. ; Postnikov, S.V. ; Lucas, K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.484-491,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
2.

Conference Proceedings
Conference Proceedings
2. Monte Carlo method for highly efficient and accurate statistical lithography simulations
Postnikov, S.V. ; Lucas, K. ; Wimmer, K. ; Ivin, V. ; Rogov, A.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1118-1126,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. Model-based design improvements for the 100-nm lithography generation
Lucas, K. ; Postnikov, S.V. ; Patterson, K. ; Yuan, C.-M. ; Thomas, C. ; Thompson, M.A. ; Carter, R. ; Litt, L.C. ; Montgomery, P.K. ; Wimmer, K.
Pub. info.: Optical Microlithography XV.  Part One  pp.215-226,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691