1.

Conference Proceedings
Conference Proceedings
1. Closing the defect printability loop: optimizing defect specifications for an established lithographic process
Patterson, K. ; Wakefield, C. ; Sixt, P. ; Sundermann, F. ; Trouiller, Y. ; Belledent, J. ; Couderc, C. ; Rody, Y. ; Lucas, K.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1076-1082,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
2.

Conference Proceedings
Conference Proceedings
2. MEV as a new constraint for lithographers in the sub-100-nm regime
Trouiller, Y. ; Postnikov, S.V. ; Lucas, K.D. ; Sundermann, F. ; Patterson, K. ; Belledent, J. ; Couderc, C. ; Rody, Y.F.
Pub. info.: Optical Microlithography XVII.  pp.1081-1092,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
3.

Conference Proceedings
Conference Proceedings
3. Critical failure ORC: application to the 90-nm and 65-nm nodes
Belledent, J. ; Shang, S.D. ; Trouiller, Y. ; Miramond, C. ; Patterson, K. ; Toublan, O.R. ; Couderc, C. ; Sundermann, F. ; Rody, Y.F.
Pub. info.: Optical Microlithography XVII.  pp.1184-1197,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377