1.

Conference Proceedings
Conference Proceedings
1. Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node
Patterson, K. ; Litt, L.C. ; Maltabes, J.G. ; Hughes, G.P. ; Robertson, T. ; Montgomery, B.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1033-1040,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
2.

Conference Proceedings
Conference Proceedings
2. New alternating phase-shifting mask conversion methodology using phase conflict resolution
Pierrat, C. ; Cote, M.L. ; Patterson, K.
Pub. info.: Optical Microlithography XV.  Part One  pp.325-335,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. Model-based design improvements for the 100-nm lithography generation
Lucas, K. ; Postnikov, S.V. ; Patterson, K. ; Yuan, C.-M. ; Thomas, C. ; Thompson, M.A. ; Carter, R. ; Litt, L.C. ; Montgomery, P.K. ; Wimmer, K.
Pub. info.: Optical Microlithography XV.  Part One  pp.215-226,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691