1.

Conference Proceedings
Conference Proceedings
1. Etching of High-k Gate Dielectrics and Gate Metal Candidates
Han, S.K ; Kim, I. ; Zhong, H ; Heuss, G.P. ; Lee, J.H ; Wicairsana, D. ; Maria, J.P. ; Misra, V. ; Osburn, C.M.
Pub. info.: Plasma processing XIV : proceedings of the international symposium.  pp.199-209,  2002.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-17
2.

Conference Proceedings
Conference Proceedings
2. Effect of Post Metallization Annealing for Alternative Gate Stack Devices
Kim, I. ; Finn, S.K. ; Osburn, C.M.
Pub. info.: Rapid thermal and other short-time processing technologies III : proceedings of the international symposium.  pp.145-152,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-11