1.

Conference Proceedings
Conference Proceedings
1. CD uniformity consideration for DUV step and scan tools
Seltmann,R. ; Minvielle,A.M. ; Spence,C.A. ; Muehle,S. ; Capodieci,L. ; Nguyen,K.B.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.239-249,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Characterization of the alignment system on a laboratory extreme ultraviolet lithography tool
Nguyen,K.B. ; Tichenor,D.A. ; Berger,K.W. ; Ray-Chaudhuri,A.K. ; Haney,S.J. ; Nissen,R.P. ; Perras,Y. ; Arling,R.W. ; Stulen,R.H. ; Fetter,L.A. ; Tennant,D.M. ; White,D.L. ; Wood,O.R.II
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.54-62,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723