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Conference Proceedings

1. First microprocessors with immersion lithography

Lee, D.-Y. ; Kim, I.-S. ; Jung, S.-G. ; Jung, M.-H. ; Park, J.-O. ; Oh, S.-H. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.119-128, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

2. 69 Highly Scalable PVD/CVD-Cobalt Bilayer Salicidation Technology for sub-50nm CMOSFETs

Yun, J.-H. ; Kim, H.-S. ; Jung, S.-W. ; Jung, E. J. ; Kim, B.-H. ; Choi, G. H. ; Kim, S. T. ; Chung, U-In. ; Moon, J.-T.

Pub. info.:	Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.577-584, 2005. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-05

Conference Proceedings

3. Water distribution within immersed polymer films

Kang, Y. ; Hong, J. ; Lee, S.-Y. ; Lee, H.-R. ; Ryoo, M.-H. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.

Pub. info.:	Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA. pp.31-39, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5753(1)

Conference Proceedings

4. Requirement of in-field illumination control for low k1 imaging below 0.3

Hwang, C. ; Shin, J. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1548-1556, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754