1.

Conference Proceedings
Conference Proceedings
1. Advanced module-based approach to effective CD prediction of sub-100nm patterns
Shin, J. ; Kim, I. ; Hwang, C. ; Park, D.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA.  pp.65-73,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5378
2.

Conference Proceedings
Conference Proceedings
2. Way for LEEPL technology to succeed in memory device application
Kim, I.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.1060-1067,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
3.

Conference Proceedings
Conference Proceedings
3. Successful application of angular scatterometry to process control in sub-100-nm DRAM device
Kim, J.- ; Kim, S.-J. ; Chin, S.-B. ; Oh, S.-H. ; Goo, D.-H. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T. ; Raymond, C.J. ; Littau, M.E. ; Youn, B.J. ; Sohn, C.-J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.541-549,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
4.

Conference Proceedings
Conference Proceedings
4. Realization of sub-80-nm small-space patterning in ArF photolithography
Kim, S.-H. ; Kim, H.-D. ; Lee, S.-H. ; Park, C.-M. ; Ryoo, M.-H. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1082-1090,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
5.

Conference Proceedings
Conference Proceedings
5. A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns
Lee, S. ; Hwang, C. ; Park, D.-W. ; Kim, I.-S. ; Kim, H.-C. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Optical Microlithography XVII.  pp.1413-1421,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
6.

Conference Proceedings
Conference Proceedings
6. Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance
Lee, J.-Y. ; Shin, J. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.426-433,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376