1.

Conference Proceedings
Conference Proceedings
1. ArF issues of 90-nm-node DRAM device integration
Goo, D.-H. ; Kim, B.-S. ; Park, J.-S. ; Yoon, K.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1296-1303,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Challenge for effective OCV control in 90-nm logic gate using ArF lithography
Kang, H.-J. ; Lee, S.-W. ; Lee, D.-Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1194-1201,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Adaptability and validity of thin organic bottom anti-reflective coating (BARC) to sub-90-nm patterning in ArF lithography
Kim, S.-H. ; Lee, S.-H. ; Yeo, G.-S. ; Lee, J.H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.940-947,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
4.

Conference Proceedings
Conference Proceedings
4. What an antishrinkage coating method can surmount among stumbling block of ArF resists
Kim, H.-D. ; Lee, S.-H. ; Choi, S.-J. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.827-837,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039